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Raymond T. Tung
Campus Affiliation: Brooklyn College
Phone: (718) 951-5807
Research Interests: Modification of schottky barrier height at metal-semiconductor interfaces by the formation of interlayers, combining UHV and Liquid Phase (CULP) processing of nanoparticles and interfaces, soft contact formation by printing in ultrahigh vacuum, a chemical perspective of the formation of band-offset and molecular level alignment at solid interfaces, schottky barrier height